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17 Oct 2023 03:03:16 UTC
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Chemical–Mechanical Polishing of 4H Silicon Carbide Wafers | RTCL.TV
### Keywords ###
#4Hsiliconcarbide #chemical–mechanicalpolishing #materialremovalrate #surfaceroughness #RTCLTV #shorts

### Article Attribution ###
Title: Chemical–Mechanical Polishing of 4H Silicon Carbide Wafers
Authors: Wantang Wang, Xuesong Lu, Xinke Wu, Yiqiang Zhang, Rong Wang, Deren Yang ,and Xiaodong Pi
Publisher: Wiley-VCH
DOI: 10.1002/admi.202202369
DOAJ URL: https://doaj.org/article/9571f632fa98417591eba6ef196bbb1b
Source URL: https://doi.org/10.1002/admi.202202369



### Image Attribution ###
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### Channels ###
YouTube Channel: https://www.youtube.com/@stemrtcltv
Odysee Channel: https://odysee.com/@stem_rtcl_tv

### Video Timestamps ###
0:00:00 - Summary
0:00:44 - Title
0:00:50 - End
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